Advanced Junction Terminal Technology of Ultra High Voltage Thyristor
DOI: 10.54647/isss120432 12 Downloads 181 Views
Author(s)
Abstract
The advantages and disadvantages of traditional thyristor`s junction terminal technology are analyzed. Based on double negative angle modeling, a new technology is developed with radial variable doping and mesa shape modification. The technology minimized the chip thickness and the junction terminal structure length on chip, as well as maximized the effective conduction length of device. Three different samples of junction terminal structure technology were manufactured and tested. The results indicate that the samples using the new technology has a smaller leakage current (2.50mA) without reducing blocking voltage (≥ 8000V) and a smaller on-state voltage drop (1.782V) under flowing the same on-state current (4500 A). Moreover, reverse recovery charge, dv/dt tolerance, di/dt tolerance and turn-off time get fully optimized. The 6-inch (1inch=2.54cm) ultra-high voltage thyristor (4500A/8500V) was successfully developed, and its dynamic characteristic and parameter consistency fulfill the design and application requirement.
Keywords
junction terminal; radial variable doping; mesa shape modification; blocking voltage; on-state current capacity; on-state voltage drop
Cite this paper
LingYi Gao, Shancheng Gao, Lai Zhang, Xiaobo Fan,
Advanced Junction Terminal Technology of Ultra High Voltage Thyristor
, SCIREA Journal of Information Science and Systems Science.
Volume 10, Issue 1, February 2026 | PP. 1-12.
10.54647/isss120432
References
| [ 1 ] | Wang Z M, Jian-Qiu L U. Six Inch Thyristor Optimised for UHVDC[J]. Power Electronics, 2008. |
| [ 2 ] | Liu Z Y. UHVDC Transmission Technology [M]. Beijing: China Electric Power Press,2010. |
| [ 3 ] | Gu L C. Thyristor [M]. Beijing:China Machine Press, 1979:3. |
| [ 4 ] | Nie D Z. New Power Electronic Devices [M]. Beijing: Weapons Industry Press, 1994. |
| [ 5 ] | Wu Y,Zhang W R, Liu X M. Semiconductor Device [M]. Beijing: Chemical Industry Press, 2005:4. |
| [ 6 ] | Nakagawa T, Satoh K, Yamamoto M, et al. 8 kV/3.6 kA light triggered thyristor[C]// International Symposium on Power Semiconductor Devices and ICS. IEEE, 1995:175-180. |
| [ 7 ] | Wang Z M. The characteristic design of the negative inclined angle thyristor is positive. [J]. Xi´an, Power Electronics,1996.18-23. |
| [ 8 ] | Li S Y. Static Induction Devices [M]. Lanzhou: Lanzhou University Press.1982:7. |
| [ 9 ] | Liu S L, Wang J H, Hong S Z. Power Semiconductor Device [M]. Hefei: Hefei University of Technology Press, 1996:3. |
| [ 10 ] | Huang H Y. Technological Fundamentals of Semiconductor Device [M]. Beijing: Beijing National Defence Industry Press,1980:9. |
| [ 11 ] | KELLNER U, PRAYBIL J, TAYLOR P, et al. Thyristor Design and Realozation [R], Wiley&Sons, Chichester 2002, 14(36):40-49. |
| [ 12 ] | Liu G W, Xie M X. Principles of Semiconductor Devices [M]. Beijing: Beijing National Defence Industry Press,1980:11. |
| [ 13 ] | SCHULZE H. Electrochemical Society Proceedings[C]//Proceeding of IEEE MTT-S Semiconductor Devices and ICs Technology Conference. Cambrige, England 1995:96-103. |